英语翻译
问题描述：
英语翻译
Fig.7 shows 3D images and surface roughness of the Siwafer by AFM to compare the unimplanted with implanted surface.Roughness of Si-wafer before N+ ion implantation is about 6 Å while it reduced to about 3 Å after implantation.The lowest surface roughness was obtained on the sample implanted with 1×1017 N cm−2 dose.This result means that the nitrogen ion implantation by PSII causes surface morphology change together with improvement in mechanical properties of trivalent chromium surface.
PSII：等离子体源离子注入
答
图7显示的是原子力显微镜下硅片在注入氮离子前后的三维立体和表面粗糙维度对比.在氮离子注入前的表面粗糙度是6 Å,而在植入后则缩减为3 Å.最底层的粗糙度是对样本植入了1×1017 N平方厘米的剂量后取得的....